Correct Answer - Option 1 : (a) – (iii), (b) - (ii), (c) - (iv), (d) – (i)
1) For a p-n junction diode, the current equation is given by:
\(I={{I}_{o}}\left( {{e}^{\frac{qV}{kT}}}-1 \right)\)
I0 = Reverse Saturation Current has a strong dependence on temperature.
V = Applied voltage
For a forward applied voltage, the current will increase exponentially.
2) In the saturation region, the current through the JFET is given by:
\(I={{I}_{DSS}}{{\left[ 1-\frac{{{V}_{GS}}}{{{V}_{p}}} \right]}^{2}}\)
IDSS = Maximum Drain current, when VGS = 0
VGS = Applied Gate to Source voltage
Vp = Pinch-off voltage
3) For a MOSFET operating in the triode or active region, the drain current is given by:
\({{I}_{D}}=\frac{Z}{~2L}{{\mu }_{o}}{{C}_{ox}}\left[ 2\left( {{V}_{G}}-{{V}_{T}} \right){{V}_{D}}-\frac{V_{DD}^{2}}{2} \right]\)
Z and L are the dimensions of the insulating layer
VT = Threshold voltage
VG = Applied Gate to Source voltage
For small values of VD(called a deep active region), the higher power can be neglected, and the current variation approximates a linear variation w.r.t. VD, i.e.
\({{I}_{d}}=\frac{Z}{L}{{\mu }_{o}}{{C}_{ox}}\left( {{V}_{G}}-{{V}_{T}} \right){{V}_{D}}\)
4) Ideal MIS diode, the difference in the work function (ϕms) of the metal and semiconductor is 0, i.e.
ϕm = ϕs
Where ϕ is the amount of work done to move the particle from the Fermi-level to vacuum.
The semiconductor Work function (ϕs) is given by:
\(\phi_s=\chi+\frac{E_g}{2}-\psi_E\)
The difference in work function will be, therefore:
\({{ϕ }_{m}}-\left( \chi +\frac{{{E}_{g}}}{2}-{{\psi }_{E}} \right)=0\)