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Elucidate the formation of a N – type and P – type semiconductors.

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1. N – type semiconductor: 

A n-type semiconductor is obtained by doping a pure Germanium (or Silicon) crystal with a dopant from group V pentavalent elements like Phosphorus, Arsenic, and Antimony. The dopant has five valence electrons while the Germanium atom has four valence electrons.

During the process of doping, a few of the Germanium atoms are replaced by the group V dopants. Four of the five valence electrons of the impurity atom are bound with the 4 valence electrons of the neighbouring replaced Germanium atom. The fifth valence electron of the impurity atom will be loosely attached with the nucleus as it has not formed the covalent bond.

The energy level of the loosely attached fifth electron from the dopant is found just below the conduction band edge and is called the donor energy level. At room temperature, these electrons can easily move to the conduction band with the absorption of thermal energy. It is shown in the figure (c). Besides, an external electric field also can set free the loosely bound electrons and lead to conduction.

It is important to note that the energy required for an electron to jump from the valence band to the conduction band (Eg) in an intrinsic semiconductor is 0.7 eV for Ge and 1.1 eV for Si, while the energy required to set free a donor electron is only 0.01 eV for Ge and 0.05 eV for Si.

The group V pentavalent impurity atoms donate electrons to the conduction band and are called donor impurities. Therefore, each impurity atom provides one extra electron to the conduction band in addition to the thermally generated electrons. These thermally generated electrons leave holes in valence band. Hence, the majority carriers of current in an n-type Semiconductor are electrons and the minority carriers are holes. Such a semiconductor doped with a pentavalent impurity is called an n-type semiconductor.

2. P – type semiconductor: 

Here, a trivalent atom from group III elements such as Boron, Aluminium, Gallium and Indium is added to the Germanium or Silicon substrate. The dopant with three valence electrons are bound with the neighbouring Germanium atom as shown in Figure (a). As Germanium atom has four valence electrons, one electron position of the dopant in the Germanium crystal lattice will remain vacant. The missing electron position in the covalent bond is denoted as a hole.

To make complete covalent bonding with all four neighbouring atoms, the dopant is in need of one more electron. These dopants can accept electrons from the neighbouring atoms. Therefore, this impurity is called an acceptor impurity. The energy level of the hole created by each impurity atom is just above the valence band and is called the acceptor-energy level, as shown in Figure (b).

For each acceptor atom, there will be a hole in the valence band in addition to the thermally generated holes. In such an extrinsic semiconductor, holes are the majority carriers and thermally generated electrons are minority carriers. The semiconductor thus formed is called a p – type semiconductor.

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